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Degradation mechanisms of the aluminium doped zinc oxide front contact
Table 6.2 Summary of deposition conditions and initial material properties of the
sputtered ZnO:Al layers.
Grain size Length scale Roughness
Sample Deposition time Thickness (surface) grains (R a ) *
RT 50 min 620 nm 0.009 μm 2 97 nm 1.8±0.6 nm
200 C 50 min 490 nm 0.013 μm 2 113 nm 2.6±1.2 nm
o
500 nm
(a) (b) (c) (d)
Figure 6.2
HIM pictures of helium etched samples ; (a) RT sample before degradation; (b) RT sample after degradation;
(c) 200 C sample before degradation; (d) 200 C sample after degradation.
o
o
RT 200°C
Before
After
Figure 6.3
o
HIM pictures of the cross-sections of RT and 200 C samples before and after exposure to 85 C/85% RH.
o
183
Table 6.2 Summary of deposition conditions and initial material properties of the
sputtered ZnO:Al layers.
Grain size Length scale Roughness
Sample Deposition time Thickness (surface) grains (R a ) *
RT 50 min 620 nm 0.009 μm 2 97 nm 1.8±0.6 nm
200 C 50 min 490 nm 0.013 μm 2 113 nm 2.6±1.2 nm
o
500 nm
(a) (b) (c) (d)
Figure 6.2
HIM pictures of helium etched samples ; (a) RT sample before degradation; (b) RT sample after degradation;
(c) 200 C sample before degradation; (d) 200 C sample after degradation.
o
o
RT 200°C
Before
After
Figure 6.3
o
HIM pictures of the cross-sections of RT and 200 C samples before and after exposure to 85 C/85% RH.
o
183